i bolded the only word in this i understandmoore's law is not everything. transistor performance is still important as i have said previously.
furthermore, using intel's process as evidence that bulk is faster is not correct. drive currents are important but FO4 inverter delays are a much better metric because drive current does not factor in capacitance or voltage which are essential to delay. getting such PMOS drive currents required a lot of doping which can lead to higher dopant fluctuations. gate pitch on intel's 32nm process isnt all that impressive and neither is their SRAM cell size. speed did hurt size imo.
i'm not debating semantics. i am trying to clarify what i am saying because i dont want to look like a jackass. it's starting to look like an SOI v. HKMG argument which is dumbtarded. a problem does not have to be so straight forward. for example: "our process is not fast enough. how can we improve its performance?". that's a problem. SOI may be able to fix it. the problem does not have to be as extreme as gate leakage where functionality is slowly being destroyed.
also HKMG is performance oriented. you can make a functional transistor on 45nm or 32nm with polySi or SiON gate dielectrics. it just would not be impressive. eventually leakage would cause transistors to act like attenuators but that's ways off.
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