http://download.intel.com/pressroom/..._Bohr_32nm.pdfOriginally Posted by flippin_waffles
Just curious, maybe the Intel insiders can enlighten.When will Intel finally catch up to GF and AMD on immersion lithography? Are they going to be able to impliment it for 32nm? AMD has had it since 45nm, I wonder if Intel are having trouble following their lead.
This is what I could find after a quick google -- page 7.
Don't confuse immersion lithography as a 'lead', immersion techniques is just that a new technique to enable printing the minimal size necessary. You get what you get, whether you print it with dry, immersion, or a hyperfine atomically sharp pencil, it doesn't matter -- it is simply a chosen technique to do what is necessary to meet the requirements. Immersion litho by itself does nothing to improve the performance of the device, it's just a printing technique.
I would think it is considered better engineering if you can make older lithography work as opposed to having to turn to something more complex. I think (and someone correct me if I am wrong), Intel used double patterning in 45 nm rather than try immersion.
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