Quote Originally Posted by SparkyJJO View Post
But the HK/MG isn't that big a deal, not on 45nm anyway.
A big enough deal that, despite their "me too" announcement a day after Intel, IBM failed to get it into their 45nm production lines... and after failing, labeled it "not necessary".


Remember?

http://www.eetimes.com/showArticle.j...leID=197002148

In a separate announcement, IBM Corp. also tipped its high-k and metal gate development efforts. Working with Advanced Micro Devices, Sony and Toshiba, IBM claims to have found a way to construct a critical part of the transistor with a new material, clearing a path toward chip circuitry that is smaller, faster and more power-efficient than previously possible.

Like Intel, IBM did not disclose what type of hafnium-based material it will use for high-k. IBM did say it has inserted the technology into its semiconductor-manufacturing line in East Fishkill, N.Y. The chip maker will apply the material to integrated circuits with line widths as small as 45 nm starting in 2008.

... not!