Thanks for replying.

Quote Originally Posted by savantu View Post
Not only that , AMD/IBM are using immersion at 45nm , a new set of problems.
Could you elaborate on what problems?

I'm just a hobbiest with a interest in the technology and my limited knowledge is gleaned mainly from picking out those who know what their actually talking about in various forums and firing off the odd question. From that what I gather is immersion lithography is essential by the 32nm node so in utilizing it with the current node AMD/IBM is if anything benefiting for the additional experience gained. While it can produce lower yeilds relative to dry lithography again, from what I've read, AMD are actually doing very well in this regard. In contrast there have been yield issues suggested at Intel's reliance of dry double patterning. I know in Australia at least availablity for Penryns have until very recently been light on the ground and generally above list price.